Materials engineering at the nanometer scale: Chemistry is the key!

Datum

21.11.2024

Zeit

16:40 - 17:40

Sprecher

Prof. Dr. Anjana Devi

Zugehörigkeit

IFW Dresden

Sprache

en

Hauptthema

Materialien

Host

Dr. Carola Langer

Beschreibung

Nanostructured thin films of advanced functional materials have shown bright prospects in a broad range of application fields that includes microelectronics, spintronics, optoelectronics, energy conversion and storage, sensing etc. For future industrial innovations, targeted material systems on wafer size need to be synthesized employing sustainable routes, which can be challenging for certain material systems such as the 2D transition metal dichalcogenides (TMDCs) or thin metal films that are used as interconnect materials. Atomic layer processing of functional materials has gained significant interest during the recent years and a range of new materials has been introduced into semiconducting manufacturing since ‘materials-limited device scaling’ has replaced the days of ‘happy geometric scaling’. The ability to integrate very thin layers into silicon structures has opened the way for a variety of novel applications which enhances the functionality and flexibility for future nanotechnologies. For atomic layer processing of materials, the precursors employed are indispensable. This presentation reveals how key precursor design parameters strongly influence the efficacy of ALD. Representative precursors, their application towards processing of functional materials and addressing sustainability issues related to precursors and materials processing will be discussed.

Links

• Seminars at the IFW

Letztmalig verändert: 21.11.2024, 07:40:28