Patterning of functional materials, structures and devices by inkjet printing technique

Date

Sep 11, 2018

Time

3:00 PM - 4:00 PM

Speaker

Dr. Bin Bao

Affiliation

University of Cambridge

Language

en

Main Topic

Materialien

Other Topics

Materialien, Physik

Host

Kristina Krummer

Description

Inkjet printing is a template free patterning technology and it is widely used to deposit minute quantities of materials in scientific research and industrial manufacturing processes. In this talk, I will demonstrate the patterning of functional materials, microstructures and electronic devices by inkjet printing techniques. Firstly, I will talk about the fabrication of quantum dot nanocomposite patterns by reactive inkjet printing. In this work, precursor-loaded inks were inkjet-printed, and quantum dot nanocomposite patterns were in-situ generated by hydrogen sulfide treatment. Then, I will demonstrate the fabrication of microstructures on polydimethylsiloxane (PDMS) surfaces by inkjet imprinting. In this part, sacrificial polymer solution ink was used as template to imprint concave patterns on the half-cured PDMS surfaces. By using liquid PDMS as substrates, embedded microcircuits could be obtained by directing printing silver nanoparticle ink into the liquid PDMS surfaces. Finally, I will demonstrate the patterning of chemical vapor deposition (CVD)-grown graphene by using inkjet-printed polymer patterns as masks for plasma etching. Based on this method, we could make graphene transistor arrays in a much simpler and faster way.

Links

• Seminars at the IFW

Last modified: Sep 11, 2018, 2:06:25 AM