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BEGIN:VEVENT
UID:DSC-15426
DTSTART;TZID=Europe/Berlin:20181210T090000
SEQUENCE:1544400607
TRANSP:OPAQUE
DTEND;TZID=Europe/Berlin:20181210T100000
URL:https://dresden-science-calendar.de/calendar/en/detail/15426
LOCATION:IFW\, Helmholtzstraße 2001069 Dresden
SUMMARY:Tan: Atomic Layer Deposition as 1D\, 2D and 3D structures
CLASS:PUBLIC
DESCRIPTION:Speaker: Dr. Lee Kheng Tan\nInstitute of Speaker: National Univ
 ersity of Singapore\, Institute of Materials and Engineering \nTopics:\nMa
 terialien\, Physik\n Location:\n  Name: IFW (D2E.27\, IFW Dresden)\n  Stre
 et: Helmholtzstraße 20\n  City: 01069 Dresden\n  Phone: \n  Fax: \nDescri
 ption: ALD has been a thin film deposition tool developed and widely used 
 in microelectronics industries for decades. The distinctive attractiveness
  of ALD are its precise film thickness control and conformal film depositi
 on. Thus\, this presentation seeks to investigate these uniqueness by usin
 g ALD as a nanofabrication tool in the preparation of nanomaterials such a
 s 1D TiO2 nanotubes arrays (NTAs)\, 2D MoS2 films and dendrites\, 3D micro
 - and nanostructures\, and also their potential applications.   An approac
 h termed “template-assisted ALD” which consists of both porous anodic 
 alumina (PAA) template and ALD technique\, results the growth of 1D TiO2 n
 anotube arrays (NTAs) on substrates. The nanotube wall-thickness is contro
 lled by the number of deposition cycles. Pd nanoparticles functionalized T
 iO2 NTAs act as UV light-activated photocatalyst. The photodegradation eff
 iciency depends on the nanotube’s wall-thickness and high surface area. 
 ALD process deposit TiO2 films conformally onto PAA templates which have d
 ifferent dimensions and morphologies. Vertically standing TiO2 NTAs are id
 eal photoanodes for dye-sensitized solar cells. The conformal coating of A
 LD process are also demonstrated on 3D ALD TiO2 structures from biological
  template such as insect fly’s wing and 3D laser printed structures.    
  ALD process using vapor phase precursors prepares 2D MoS2 mono- and multi
 layers films on sapphire substrates. The monolayer MoS2 film having a tria
 ngular crystals structure after annealing process\, exhibited high photolu
 minescence emission in visible range. Alternatively\, a modified ALD proce
 ss using liquid phase precursor and spin-spray method\, prepares MoS2 film
 s consisting of triangular and dendrite morphologies on sapphire substrate
 s. This liquid atomic layer growth by spin-spray (LAL-SS) approach produce
 s MoS2 film with monolayer thickness and controllable morphology\, without
  the use of high vapor pressure precursors and a vacuum system. This cost-
 effective LAL-SS process is capable to produce TMDCs crystals for applicat
 ions in photonics\, electronics and catalysis. It also paves the ability t
 o discover more shape-dependent properties for other TMDCs materials.
DTSTAMP:20260623T184859Z
CREATED:20181206T000523Z
LAST-MODIFIED:20181210T001007Z
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