Precise control of interfaces in Bi2Te3-based thermoelectric materials with atomic layer deposition

Date

Jan 13, 2026

Time

9:00 AM - 10:00 AM

Speaker

Prof. Seong Keun Kim

Affiliation

Korea Institute of Science and Technology | KU-KIST Graduate School of Converging Science & Techn.

Language

en

Main Topic

Materialien

Host

Martina Javorka

Description

Enhancing the performance of thermoelectric materials remains critical for practical applications. Increasing the power factor and reducing the thermal conductivity are key strategies for improving the thermoelectric performance. Doping, incorporating secondary phases, and generating dislocations can be used to introduce defects and grain boundaries to improve the thermoelectric performance. The application of an ultrathin film as a coating on thermoelectric materials via atomic layer deposition (ALD) has recently attracted attention as a novel approach to enhance the performance. The excellent conformality of ALD enables the conformal deposition of ultrathin films on powder to enable the interfacial properties to be meticulously controlled even after sintering. Using ALD to deposit an ultrathin layer on the thermoelectric powder matrix induces various defects through the interactions of the coating material with the thermoelectric matrix, which provide exquisite control over the material properties. In this presentation, I will present our recent studies on ALD coatings of ultrathin films on Bi2Te3-based thermoelectric materials, focusing on the underlying mechanisms and the effects on the thermoelectric performance.

Links

• Seminars at the IFW

Last modified: Jan 11, 2026, 7:35:40 AM